Mark detection method and unit, exposure method and apparatus, and device manufacturing method and device

   
   

In view of a specific area having a characteristic surface state in a mark-formed area or a surrounding area thereof, an area calculation unit has a window having a dimension corresponding to the specific area scan the whole measurement area in order to obtain a quantity representing a surface state based on measured signals through the window, and then, by identifying a measured signal area corresponding to the specific area based on the quantity as a function of the window's position, extracts a measured signal area corresponding to the mark. And a position calculation unit performs computation such as pattern-matching on the signal area extracted, thereby detecting the position of the mark accurately and quickly.

 
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