Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus

   
   

An absolute accuracy in the range from .+-.2 nm to .+-.1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement value while a stage is moving, thereby providing a high accuracy.

Uma exatidão absoluta na escala do +-.2 nm ao +-.1 nm para um valor da medida do deslocamento é fornecida por um sistema de medição do deslocamento do interferometer do laser. Um componente flutuando do erro que pareça correspondente ao ciclo da onda da luz de laser é detectado e subtraído do valor da medida quando um estágio se mover, fornecendo desse modo uma exatidão elevada.

 
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