Negative resist composition, process for forming resist patterns, and process for manufacturing electron device

   
   

A negative resist composition comprises at least a constituent component which has a vinyl ether structure protected with an acetal in a molecule thereof. In the formation of negative resist patterns, an aqueous basic solution can be used without swelling.

 
Web www.patentalert.com

< Olefin polymerization catalysis with aryl substituted carbenium cationic complexes

< High activity metal carbene metathesis catalysts generated using a thermally activated N-heterocyclic carbene precursor

> Photoacid generators and photoresists comprising same

> Processes for producing cycloolefin addition polymer

~ 00122