Illumination system and scanning exposure apparatus using the same

   
   

An exposure apparatus for illuminating an original with light from a light source and for projecting a pattern of the original, as illuminated, onto a surface to be exposed, includes a hologram, an optical system for projecting light from the light source onto the hologram, a slit device disposed at a predetermined position where light of a slit-like shape is to be substantially produced by the hologram, and an imaging optical system for illuminating the original with the light passed through a slit of the slit device. The slit device serves to determine an illumination region of light projected onto the original.

 
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