The present invention provides a device for in-situ measurement and
recording of various environmental parameters in a semiconductor
fabrication process. The device includes sensors for detecting the
parameters and converting them to sensor outputs and a data logger coupled
to the sensors for receiving the sensor outputs and logging them in a
file. The device may also include an analog to digital converter to
convert the sensor outputs to digital data and a communication module to
communicate the digital data with other devices. When applied to reticles
used in a semiconductor fabrication process comprising a plurality of
stages, the device may be used to monitor electrostatic field and
electrostatic discharge activities on and around the reticle, convert the
monitored parameters into data, and log the data along with a timestamp
and an identification of each individual stage. Logged data can be
retrieved and analyzed to determine the time and location of detrimental
activities such as electrostatic discharge on reticles.
