A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: ##STR1## where R.sub.1 and R.sub.2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x, y, v and w are independently integers from 1 to 6.

Uma composição resistir inclui um polímero photosensitive que tem um lactone em sua espinha dorsal. O polímero photosensitive da composição resistir inclui ao menos um dos monomers que têm as fórmulas: ## do ## STR1 onde R.sub.1 e R.sub.2 são independentemente um átomo do hidrogênio, um alkyl, uns hydroxyalkyl, alkyloxy, carbonyl ou ester, e x, y, v e w são independentemente inteiros de 1 a 6.

Web www.patentalert.com

< Cycloolefin blends and method for solvent bonding polyolefins

< Composition comprising cycloaliphatic epoxy resin, 4-methylhexahydrophthalic anhydride curing agent and boron catalyst

> Hydrosilylation crosslinking of thermoplastic elastomer

> Resin system

~ 00065