Provided is an imprint method that includes the steps of softening resist in an object to be processed, by using compressed gas or supercritical fluid, the object including a substrate and the resist applied onto the substrate, and transferring a predetermined pattern onto the resist by pressing a mold that forms the predetermined pattern against the resist in the object.

 
Web www.patentalert.com

< Photoresponsive polymer, built-up type diacetylene polymer, crystal of ammonium carboxylate, and method for manufacturing them

< Phosphate-binding protein, pharmaceutical compositions containing same and use thereof

> Control layer for a nanoscale electronic switching device

> Utilizing nanowire for different applications

~ 00614