Methods for fabricating nanoscale features are disclosed. One technique involves depositing onto a substrate, where the first layer may be a silicon layer and may subsequently be etched. A second layer and third layer may be deposited on the etch first layer, followed by the deposition of a silicon cap. The second and third layer may be etched, exposing edges of the second and third layers. The cap and first layer may be removed and either the second or third layer may be etched, creating a nanoscale pattern.

 
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< Carbon nanotube transistor fabrication

> Reversible biogel for manipulation and separation of single-walled carbon nanotubes

> Receiver circuit using nanotube-based switches and transistors

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