A plurality of wiring patterns are formed so as to extend in parallel with each other. A plurality of test terminals are formed in a substantially rectangular shape such that respective widths thereof increase toward respective one sides from respective ends of the plurality of wiring patterns. The plurality of test terminals in each group are arranged so as to be aligned along a length direction of the wiring patterns. The wiring patterns are formed so as to be longer in the order, and the test terminals are further away from a mounting region in the order. An interval (width of a plating resist) between the test terminals in each group and the wiring patterns in the other group adjacent thereto is set to decrease in the order.