At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20.degree. or more. A sliding angle of the second portion with respect to the liquid is 20.degree. or less.