An apparatus includes a spinal implant configured to be disposed within an interspinous process space between a first spinous process of a spinal column and a second spinous process of the spinal column. The spinal implant includes a plurality of elongate spacers. A first elongate spacer from the plurality of elongate spacers is configured to slidably contact at least a second elongate spacer from the plurality of elongate spacers. The spinal implant includes an elastic member configured to allow movement of each elongate spacer from the plurality of elongate spacers relative to the remaining elongate spacers from the plurality of elongate spacers within a predetermined range of motion.