The present invention provides a solution for interleaving data frames, in a semiconductor device manufacturing system in which the processing apparatus for conducting a process on any one of a semiconductor substrate and a thin film on a surface thereof; a self-diagnostic system for diagnosing a state of the processing apparatus; and a parameter fitting apparatus for maintaining a parameter of the self-diagnostic system when an inspection result of the semiconductor substrate having undergone the process has been determined to be correct, and for changing the parameter of the self-diagnostic system when the inspection result has been determined to be incorrect.

 
Web www.patentalert.com

< Semiconductor optical device and a method of fabricating the same

< Semiconductor wafer, panel and electronic component with stacked semiconductor chips, and also method for producing same

> Integrated circuit and method of implementing a contact pad in an integrated circuit

> Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product
~ 00600