The gas barrier film of the present invention is a gas barrier film comprising a base material, and an inorganic thin film composed of a silicon oxide film formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide film observed by an electron spin resonance method (ESR method) is from 1.times.10.sup.16 to 1.times.10.sup.19 spins/cm.sup.3, or a gas barrier film comprising a base material, an inorganic thin film containing silicon oxide and the other metal component formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide in the inorganic thin film observed by an ESR method is from 13.times.10.sup.14 to 3.times.10.sup.17 spins/mol, and a laminate wherein at least one paper and/or plastic film is laminated on the gas barrier film.