A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the substrate, a first developer nozzle to be used in common by the plural developing units to pour the developer in a band-shaped flow onto the substrates held by each of the substrate holding devices, a nozzle driving mechanism for carrying the first developer nozzle from one to another of the developing units, and moving the first developer nozzle with one end of a band-shaped area into which the developer is to be poured through the first developer nozzle directed toward the center of the substrate in each of the developing units such that a part in a surface of the substrate onto which the developer is poured moves from a central part toward a peripheral part or from a peripheral part toward a central part in the surface of the substrate to coat the surface of the substrate entirely with a developer film, and second developer nozzles for pouring the developer into a circular area or a band-shaped area of a short length shorter than that of the band-shaped area into which the first developer nozzle pours the developer in a central part of the substrate on which the developer film has been formed by the first developer nozzle. The nozzles are used selectively for developing steps.