A n-type layer, a multiquantum well active layer comprising a plurality of pairs of an InGaN well layer/InGaN barrier layer, and a p-type layer are laminated on a substrate to provide a nitride semiconductor light emitting element. A composition of the InGaN barrier included in the multiquantum well active layer is expressed by In.sub.xGa.sub.1-xN (0.04.ltoreq.x.ltoreq.0.1), and a total thickness of InGaN layers comprising an In composition ratio within a range of 0.04 to 0.1 in the light emitting element including the InGaN barrier layers is not greater than 60 nm.

 
Web www.patentalert.com

< Zirconium-doped tantalum oxide films

> Method for manufacturing silicon wafers

> Optoelectronic chip

~ 00581