A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a copolymer comprising units A, B, and a unit C comprising a cyclic terminal urea group, wherein unit A is present in an amount of about 5 to about 50 mol % and .[.has the formula.]. .Iadd.is represented by.Iaddend. ##STR00001## wherein R.sup.1 is selected such that the homopolymer of A is alkali-soluble, unit B is present in an amount of about 20 to about 70 mol % and .[.has the following formula.]. .Iadd.is represented by.Iaddend. ##STR00002## wherein R.sup.2 is selected such that the homopolymer of B has a glass transition temperature greater than 100.degree. C., preferably a glass transition temperature in the range from about 100 to about 380.degree. C., and the unit C comprising a cyclic terminal urea group is present in an amount of about 10 to about 50 mol % and .[.has the formula.]. .Iadd.is represented by.Iaddend. ##STR00003## wherein X is a spacer group which is preferably selected from the group consisting of (a) a --(CR.sub.2).sub.m-- chain, (b) a --[CH.sub.2--CH.sub.2--O].sub.m-- chain; and (c) a --[Si(R.sub.2)--O].sub.m-- unit, wherein m is an integer greater than or equal to 1, more preferably between 2 and 12, the spacer group is connected to one of the carbon ring atoms of the cyclic urea unit or to one of the nitrogen atoms of the cyclic urea unit, and n is an integer greater than or equal to 1, more preferably between 1 and 5; and .[.Y is a group selected from the group consisting of:.]. ##STR00004## wherein each R .[.in units A, B, and C, the --(CR.sub.2).sub.m-- chain, the --[Si(R.sub.2)--O].sub.m-- unit, and group Y.]. .Iadd.represents a bond between the cyclic urea and the spacer group X, or .Iaddend.is independently selected from hydrogen, aryl, (C.sub.1-C.sub.12) alkyl, .[.and.]. .Iadd.or .Iaddend.halogen.