A method for fabricating an LCD device comprising: providing first and second substrates; forming an active area having a source region, a drain region, a channel region, and a storage region on the first substrate; forming a first insulation film on the first substrate; forming a gate electrode, a gate line and a pixel electrode on the first substrate and forming a storage line partially overlapping with the storage region; forming a second insulation film on the first substrate; forming first and second contact holes exposing a portion of the source and drain regions by removing a portion of the first and second insulation films and exposing the pixel electrode by removing the second insulation film on the pixel electrode; and forming a source electrode electrically connected to the source region through the first contact hole and forming a drain electrode electrically connected to the drain region through the second contact hole and partially overlapping with the storage line.

 
Web www.patentalert.com

< Nanoelectromechanical digital inverter

> Thin film transistor array substrate, liquid crystal display panel having the same, and method of manufacturing thin film transistor array substrate and liquid crystal display panel

> Dual-gate device and method

~ 00556