Provided are a method and apparatus for designing a fine pattern that can
be entirely transferred onto an object. The method includes reading the
original data of a fine pattern for exposure. The fine pattern is divided
into a first pattern not requiring revision and a second pattern
requiring revision. The fine pattern is revised by forming an auxiliary
pattern maintaining a first distance D1 from the second pattern. A fine
pattern to be transferred onto a target object is estimated by running an
emulation program including a first auxiliary pattern and a second
auxiliary pattern. The estimated fine pattern is compared to the original
data of the fine pattern for exposure, and the revised fine pattern is
designated as a final fine pattern if there is no difference between the
estimated fine pattern and the original data of the fine pattern for
exposure.