Methods of forming arrays of small, densely spaced holes or pillars for use in integrated circuits are disclosed. Various pattern transfer and etching steps can be used, in combination with pitch-reduction techniques, to create densely-packed features. Conventional photolithography steps can be used in combination with pitch-reduction techniques to form superimposed patterns of crossing elongate features with pillars at the intersections. Spacers are simultaneously applied to sidewalls of both sets of crossing lines to produce a pitch-doubled grid pattern. The pillars facilitate rows of spacers bridging columns of spacers.

 
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< Purification of carbon nanotubes based on the chemistry of fenton's reagent

> Nanoscale electronic devices and fabrication methods

> Probe for a scanning magnetic force microscope, method for producing the same, and method for forming ferromagnetic alloy film on carbon nanotubes

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