Antireflective films and low refractive index compositions are described. The low refractive index layer comprises the reaction product of a composition comprising at least one free-radically polymerizable material having a high fluorine content, and at least one free-radically polymerizable fluoropolyether urethane material.

 
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> Material composition for nano- and micro-lithography

> Porous materials embedded with nanospecies, methods of fabrication thereof, and methods of use thereof
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