Disclosed are an automated data analysis system and method. They system provides a standardized data analysis request form that allows a user to select an experiment (e.g., a wafer-level based yield split lot (EWR) analysis, a lot-level based process change notification (PCN) analysis, and lot-level based tool/mask qualification analysis) and a data analysis for a specific process module of interest. For each specific data analysis request, the system identifies critical test parameters, which are grouped depending on in-line test levels and photolithography levels. The system links the analysis request to test data sources and automatically monitors the test data sources, searching for the critical test parameters. When the critical test parameters become available, the system automatically performs the requested analysis, generates a report of the analysis and publishes the report with optional drill downs to more detailed results. The system further provides automatic e-mail notification of the published report.