The present invention recites a composition comprising a first compound
and a second compound. The first compound has the chemical formula ( 1a),
wherein m, n and o are independently from each other equal to 2 or 3;
wherein p is equal to 1 or 2; R being a chemical group with the chemical
formula (1a'), wherein q is equal to 1, 2 or 3; wherein R.sub.1, R.sub.2
and R.sub.3 are independently selected from the group consisting of
hydrogen and an organic group. The second compound has the chemical
formula (1c). Metal ions can be present in the solution or in an external
medium being contacted with the solution. The present invention can be
used for cleaning a semiconductor substrate. ##STR00001##