An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes a first stage which is movable relative to the projection optical system, a second stage which is movable relative to the projection optical system, and a liquid immersion system that is capable of forming a liquid immersion region of a liquid under the projection optical system. The first and second stages are moved in a state in which a first overhang portion provided at the first stage and a second overhang portion provided at the second stage are brought close to or in contact with each other, such that the liquid immersion region is moved from one of upper surfaces of the first and second overhang portions to the other of the upper surfaces of the first and second overhang portions.