A lithographic system includes a source of a laser beam; a beamsplitter
dividing the laser beam into a plurality of beams; and a plurality of
reflecting surfaces that forms interference fringes on a substrate using
the plurality of beams. Resolution of the lithographic system is
adjustable by adjusting angular orientation of the reflecting surfaces.
The beamsplitter is movable along the optical path to adjust the
resolution. The reflecting surfaces may be facets of a prism. Each
reflecting surface corresponds to a particular beamsplitter position
along the optical path, and/or to a particular resolution. The
beamsplitter includes a linear grating or a checkerboard grating. The
beams are N-way symmetric. A numerical aperture of the system is
adjustable by moving the beamsplitter along the optical path. A liquid
can be between the substrate and the prism.