One embodiment of the present invention provides a system that determines
the locations and dimensions of one or more assist features in an
uncorrected or corrected mask layout. During operation, the system
receives a mask layout. The system then creates a set of candidate assist
feature configurations, which specify locations and sizes for one or more
assist features in the mask layout. Next, the system determines an
improved assist feature configuration using the set of candidate assist
feature configurations and a process-sensitivity model which can be
represented by a multidimensional function that captures
process-sensitivity information. Note that placing assist features in the
mask layout based on the improved assist feature configuration improves
the manufacturability of the mask layout. Moreover, using the
process-sensitivity model to determine the improved assist feature
configuration reduces the computational time required to determine the
improved assist feature configuration in the mask layout.