A method for removing contaminants from synthetic resin material containers using a first organic solvent system and a second carbon dioxide system. The organic solvent is utilized for removing the contaminants from the synthetic resin material and the carbon dioxide is used to separate any residual organic solvent from the synthetic resin material.

 
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< Hydrogenation of polymers in the presence of supercritical carbon dioxide

> Supercritical developing for a lithographic process

~ 00488