A method for cleaning a metal mask is disclosed. The method includes washing the metal mask with an organic solvent that dissolves an organic substance adhered to the metal mask, washing, with pure water, the metal mask from which the adhering substance has been removed, and vacuum drying the metal mask that has been washed with the pure water.

 
Web www.patentalert.com

< Staged Membrane Oxidation Reactor System

> Silicon Electrochemical Sensors

~ 00483