CMOS implementable three-dimensional silicon sensors are fabricated using
a standard fab but using augmented rules that create mask patterns not
expressible with existing fab rules. Standard fab rules are not optimized
to produce high quality three-dimensional silicon sensors. Accordingly,
the normal set of rules does not permit creating the fab mask patterns
necessary for high performance such sensors. However, the present
invention can use the fab standard mask set with a rich set of fab
instructions to express mask patterns from the mask set that would not
otherwise be expressible. The resultant method enables high quality
silicon sensors for three-dimensional sensing to be readily mass produced
from a standard fab.