Systems and methods for measuring one or more characteristics of patterned
features on a specimen are provided. One system includes an optical
subsystem configured to acquire measurements of light scattered from the
patterned features on the specimen at multiple angles of incidence,
multiple azimuthal angles, and multiple wavelengths simultaneously. The
system also includes a processor configured to determine the one or more
characteristics of the patterned features from the measurements. One
method includes acquiring measurements of light scattered from the
patterned features on the specimen at multiple angles of incidence,
multiple azimuthal angles, and multiple wavelengths simultaneously. The
method also includes determining the one or more characteristics of the
patterned features from the measurements.