Systems and methods are provided for an on-chip decoupling device and
method. One aspect of the present subject matter is a capacitor. One
embodiment of the capacitor includes a substrate, a high K dielectric
layer doped with nano crystals disposed on the substrate, and a top plate
layer disposed on the high K dielectric layer. According to one
embodiment, the high K dielectric layer includes Al.sub.2O.sub.3.
According to other embodiments, the nano crystals include gold nano
crystals and gold nano crystals. One capacitor embodiment includes a MIS
(metal-insulator-silicon) capacitor fabricated on silicon substrate, and
another capacitor embodiment includes a MIM (metal-insulator-metal)
capacitor fabricated between the interconnect layers above silicon
substrate. The structure of the capacitor is useful for reducing a
resonance impedance and a resonance frequency for an integrated circuit
chip. Other aspects are provided herein.