The present invention provides a polishing slurry which remarkably inhibits the occurrence of scratch, dishing or erosion. According to the present invention, provided is a polishing slurry comprising organic particles (A), an oxidizing agent and a complexing agent, wherein said organic particles (A) are those obtained by coating a part of the surface of an organic particle (B) having functional groups capable of reacting with a metal to be polished on the surface with a resin (C) free from functional groups capable of reacting with a metal to be polished, and the organic particle (B) is preferably one containing a copolymer obtained by polymerization of a monomer composition comprising 1 to 50 weight % of one, two or more monomers selected from a monomer having a carboxyl group, a monomer having a hydroxyl group, a monomer having an amino group, a monomer having an acetoacetoxy group and a monomer having a glycidyl group, and 99 to 50 weight % of other monomers, with each percentage based on the total weight of the monomers.