A method and system for making a photographic mask. The method includes determining a first contact area, processing information associated with the first contact area, and determining whether a first optical compensation should be applied to the first contact area based on at least information associated with the first contact area. Additionally, the method includes if the first optical compensation should be applied to the first contact area, applying the first optical compensation to the first contact area, processing information associated with first optical compensation, determining a first distance between the first optical compensation and a second optical compensation or a second contact area, processing information associated with the first distance, and adjusting the first optical compensation based on at least information associated with the first distance.