Methods are provided for cleaning a microelectronic device, and one method
includes providing a substrate having a patterned SOG/anti-reflective
material; performing a process to cure the patterned SOG/anti-reflective
material; and performing a cleaning process to remove the cured
SOG/anti-reflective material. An apparatus for cleaning a microelectronic
device is provided that includes a processing chamber; means for
performing a SOG/anti-reflective material curing process within the
processing chamber, means for performing a cleaning process within the
processing chamber and means for venting the processing chamber.