Embodiments of the present invention describe a method of forming a multi-cornered film. According to the embodiments of the present invention, a photoresist mask is formed on a hard mask film formed on a film. The hard mask film is then patterned in alignment with the photoresist mask to produce a hard mask. The width of the photoresist mask is then reduced to form a reduced width photoresist mask. A first portion of the film is then etched in alignment with the hard mask. The hard mask is then etched in alignment with the reduced width photoresist mask to form a reduced width hard mask. A second portion of the film is then etched in alignment with the reduced width hard mask.