A method of fabricating a patterned magnetic layer comprises sequential steps of:(a) providing a workpiece comprising a non-magnetic substrate, a layer of magnetic material overlying a surface of the substrate, and a layer of a non-magnetic material overlying the layer of magnetic material;(b) forming a layer of a mask material on the layer of non-magnetic material;(c) forming a topographical pattern comprising a plurality of recesses in the layer of mask material;(d) selectively removing portions of the layer of non-magnetic material proximate lower portions of the recesses, thereby exposing selected portions of the layer of magnetic material;(e) treating the exposed portions of the layer of magnetic material with a liquid for reducing the magnetic properties thereof; and(f) removing the topographically patterned layer of mask material.