An apparatus which exposes a substrate to radiant energy includes a unit which holds a first mask having a pattern which includes a pattern of a target mark, a unit which projects a pattern of radiant energy to the substrate through the first mask, a unit which holds a second mask having an auxiliary pattern for identifying the target mark to be formed on the substrate, and a unit which controls the projecting unit so as to project a pattern of radiant energy to the substrate through the second mask.

 
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> Method for operating a wiper system, and corresponding wiper system

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