A spine distraction implant alleviates pain associated with spinal
stenosis and facet arthropathy by expanding the volume in the spine canal
and/or neural foramen. The implant provides a spinal extension stop while
allowing freedom of spinal flexion. An interspinous process implant with
a selectably expandable spacer can be placed between adjacent spinous
processes. a device implanted between the spinous processes of adjacent
vertebrae of the spine can be used for relieving pain associated with the
vertebrae and surrounding tissues and structures by maintaining and/or
adding distraction between adjacent vertebrae. A tissue expander can be
adapted to move from a first insertion position, for ease of implantation
between spinous processes, to a second retention position that prevents
displacement of the implant. An embodiment of a system can include an
implant having a spacer with a thickness and a wing, wherein a first
configuration of the wing has a first height substantially similar to the
thickness and wherein the wing is adapted to be selectably arranged in a
second configuration such that the wing has a second height greater than
the first height. A periphery of the implant has a shape generally
conformal with a shape of an inner surface of a cannula and a
cross-sectional diameter smaller than an inner diameter of the cannula.
The cannula is inserted such that a proximal end of the cannula is
arranged between the adjacent spinous processes. The implant is then
urged into position between the adjacent spinous processes by way of the
cannula, and subsequently arranged in a second configuration to fix the
implant in position.