An overlay mark for determining the relative position between two or more
successive layers of a substrate or between two or more separately
generated patterns on a single layer of a substrate is disclosed. The
overlay mark includes a plurality of coarsely segmented lines that are
formed by a plurality of finely segmented bars. In some cases, the
coarsely segmented lines also include at least one dark field while being
separated by a plurality of finely segmented bars and at least one clear
field. In other cases, the coarsely segmented lines are positioned into
at least two groups. The first group of coarsely segmented lines, which
are separated by clear fields, are formed by a plurality of finely
segmented bars. The second group of coarsely segmented lines, which are
separated by dark fields, are also formed by a plurality of finely
segmented bars.