An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 k.OMEGA.m or less.

 
Web www.patentalert.com

< Photoelectric transducer and its manufacturing method

> Film substrate and its manufacturing method

~ 00423