The present invention relates to a chemically amplified polymer having a
pendent group with dicyclohexyl bonded thereto, a process for the
preparation thereof, and a resist composition comprising it, and more
particularly, to a novel (meth)acrylic or norbornene carboxylate compound
with dicyclohexyl bonded thereto, a process for the preparation thereof,
a chemically amplified polymer synthesized therewith, and a positive
photoresist composition for ArF comprising said polymer, with high
resolution and excellent etching resistance.