A coating and developing apparatus comprises a process block which forms a
resist film on a wafer, then transfers the wafer to an exposure
apparatus, and performs a developing process on the wafer after exposure,
and an interface transfer mechanism provided between the process block
and the exposure apparatus. The process block includes unit blocks for
coating-film formation and unit blocks for development laid out in a
stacked manner. When an abnormality occurs in the interface transfer
mechanism, an ordinary process in the unit block for coating-film
formation is performed on those substrates which are present in that unit
block for coating-film formation, after which processed wafers are
retreated to a retaining unit and transfer of any wafer into the unit
block for coating-film formation is inhibited.