A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.

 
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< Magnetic recording medium including a magnetic layer with first magnetic particles and a protective layer with second magnetic particles

> High throughput screening of crystallization of materials

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