A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.

 
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< Light beam apparatus and method for orthogonal alignment of specimen

> Apparatus and method for optical characterization of a sample over a broadband of wavelengths while minimizing polarization changes

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