A spacer on which static electricity is restricted and an electron beam
apparatus in which the spacer is provided. In the electron beam apparatus
comprising an electron source provided with electron emission devices, a
face plate provided with anodes and spacers installed between the
electron source and the face plate, unevenness is formed on the surface
of the spacer substrate, and further a thin film which has a smaller
thickness than a roughness. This makes possible the restriction of
incident angle multiplication coefficient for the primary electrons whose
energy is lower than the second cross-point energy of a resistive film.
The electron beam apparatus provided with the above spacer is excellent
in display definition and long-term reliability since the display of
light emission points and the creeping discharge accompanying the static
electricity can be restricted due to the spacer.