A method for determining degree of organoclay delamination and degree of layer alignment in a polymer organoclay nanocomposite comprising one or more infrared light spectral measurements selected from the group consisting of (A) Si--O absorption bandwidth, (B) Si--O absorption band intensity, (C) Si--O absorption band area, and (D) Si--O absorption anisotropy.

 
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> FinFET transistor device on SOI and method of fabrication

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