A process is disclosed for the manufacture of CF.sub.3CH.sub.2CHF.sub.2 and CF.sub.3CHFCh.sub.2F. The process involves (a) reacting hydrogen fluoride, chlorine, and at least one halopropene of the formulaCX.sub.3CCl.dbd.CClX (where each X is independently F or Cl) to produce a product including both CF.sub.3CCl.sub.2CClF.sub.2 and CF.sub.3CClFCCl.sub.2F; (b) reacting CF.sub.3CCl.sub.2CClF.sub.2 and CF.sub.3CClFCCl.sub.2F produced in (a) with hydrogen to produce a product including both CF.sub.3CH.sub.2CHF.sub.2, and CF.sub.3CHFCH.sub.2F; and (c) recovering CF.sub.3CH.sub.2CHF.sub.2 and CF.sub.3CHFCh.sub.2F from the product produced in (b). In (a), the CF.sub.3CCl.sub.2CClF.sub.2 and CF.sub.3CClFCCl.sub.2F are produced in the presence of a chlorofluorination catalyst including a ZnCr.sub.2O.sub.4/crystalline .alpha.-chromium oxide composition, a ZnCr.sub.2O.sub.4/crystalline .alpha.-chromium oxide composition which has been treated with a fluorinating agent, a zinc halide/.alpha.-chromium oxide composition and/or a zinc halide/.alpha.-chromuim oxide composition which has been treated with a fluorinating agent.

 
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> Methods for forming patterns on a filled dielectric material on substrates

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