An exposure apparatus that irradiates excitation laser onto a target, and
generates from generated plasma a light source for generating
illumination light of an extreme ultraviolet region or an X-ray region
includes an illumination optical system that uses the illumination light
to illuminate a catoptric reticle that forms a pattern to be transferred,
the illumination optical system including a first mirror closest to the
light source, an ellipsoidal mirror for condensing the illumination light
in front of the first mirror in the illumination optical system, and a
projection optical system that reduces and projects the pattern reflected
on the reticle onto an object to be exposed, wherein light where an
optical-axis direction of the excitation laser proceeds beyond a position
that generates the plasma by the excitation laser does not interfere with
components in the exposure apparatus including the illumination and
projection optical systems, and the ellipsoidal mirror.