An apparatus of evaluating a layer matching deviation based on CAD
information of the invention, is provided with means for storing CAD data
and a function of displaying to overlap a scanning microscope image of a
pattern of a semiconductor device formed on a wafer and a design CAD
image read from the storing means and a function of evaluating
acceptability of formation of the pattern by displaying to overlap a
pattern image of the semiconductor device formed on the wafer and the
design CAD image of the pattern, in addition thereto, a function capable
of evaluating acceptability of formation of the pattern also with regard
to a shape and positional relationship with a pattern formed at a later
step by displaying to overlap a design CAD image of the pattern formed at
the later step.