A positive resist composition comprising: at least two resins which differ in glass transition temperature by at least 5.degree. C.; and a compound which generates an acid upon irradiation with actinic rays or radiation, wherein each of the two resins comprises at least either of a repeating unit derived from an acrylic acid derivative monomer and a repeating unit derived from an methacrylic acid derivative monomer and further comprises an alicyclic structure and at least one group that increases a solubility of the resin in alkaline developer by the action of an acid.

 
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> Crystallization of MvaS (HMG-CoA Synthase)

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