A cathode sputtering source comprises a heat sink comprising a
substantially circularly-shaped planar disk formed of an electrically and
thermally conductive material, with a circumferentially extending edge
connecting first and second opposing major surfaces, the first major
surface including a plurality of radially extending, recessed gas supply
channels formed therein and extending from a central recess formed in the
first major surface to the circumferentially extending edge; the second
major surface including a gas inlet formed adjacent the circumferentially
extending edge; a gas flow channel formed in the interior of the disk
fluidly connects the gas inlet and central recess; and a substantially
circular disk-shaped sputtering target is mounted on the first major
surface, whereby gas supplied to the gas inlet is substantially uniformly
distributed around the entirety of the circumferentially extending edge
of the heat sink. Preferred embodiments include a rotatable magnetron
magnet assembly positioned behind the heat sink.